Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13405068Application Date: 2012-02-24
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Publication No.: US08835095B2Publication Date: 2014-09-16
- Inventor: Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
- Applicant: Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-039455 20110225
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/11 ; G03F7/027 ; G03F7/20
Abstract:
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.
Public/Granted literature
- US20120219905A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2012-08-30
Information query
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