发明授权
- 专利标题： Illumination system for use in a stereolithography apparatus
- 专利标题（中）： 用于立体光刻设备的照明系统
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申请号： US13254612申请日： 2010-03-08
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公开(公告)号： US08836916B2公开(公告)日： 2014-09-16
- 发明人: Jacobus Hubertus Theodoor Jamar , Andries Rijfers , Borgert Kruizinga , Jentske D. Kooistra , Mark Herman Else Vaes
- 申请人： Jacobus Hubertus Theodoor Jamar , Andries Rijfers , Borgert Kruizinga , Jentske D. Kooistra , Mark Herman Else Vaes
- 申请人地址： NL Delft NL Heerlen
- 专利权人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO,DSM IP Assets B.V.
- 当前专利权人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO,DSM IP Assets B.V.
- 当前专利权人地址： NL Delft NL Heerlen
- 代理机构： Swanson & Bratschun, L.L.C.
- 优先权： EP09154568 20090306
- 国际申请： PCT/NL2010/050116 WO 20100308
- 国际公布： WO2010/101466 WO 20100910
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/42 ; B29C67/00 ; G03F7/20
摘要：
The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.