Invention Grant
- Patent Title: Method for contamination removal using magnetic particles
- Patent Title (中): 使用磁性颗粒去除污染物的方法
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Application No.: US12483518Application Date: 2009-06-12
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Publication No.: US08845812B2Publication Date: 2014-09-30
- Inventor: Nishant Sinha , Steve Kramer , Gurtej Sandhu
- Applicant: Nishant Sinha , Steve Kramer , Gurtej Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: B08B7/00
- IPC: B08B7/00
Abstract:
Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.
Public/Granted literature
- US20100313907A1 Method and Apparatus for Contamination Removal Using Magnetic Particles Public/Granted day:2010-12-16
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