Invention Grant
- Patent Title: Magnetic device and method of manufacturing the same
- Patent Title (中): 磁性装置及其制造方法
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Application No.: US13600422Application Date: 2012-08-31
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Publication No.: US08847342B2Publication Date: 2014-09-30
- Inventor: Woo-cheol Lee , Tokashiki Ken , Hyung-joon Kwon , Myung-hoon Jung
- Applicant: Woo-cheol Lee , Tokashiki Ken , Hyung-joon Kwon , Myung-hoon Jung
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0130474 20111207
- Main IPC: H01L27/22
- IPC: H01L27/22
Abstract:
A method of manufacturing a magnetic device includes forming a stack structure, the stack structure including a magnetic layer, and etching the stack structure by using an etching gas, the etching gas including at least 80% by volume of H2 gas.
Public/Granted literature
- US20130146997A1 MAGNETIC DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-06-13
Information query
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