Invention Grant
US08851106B2 Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus 有权
气体供给装置,具有该气体供给装置的气缸柜,阀箱和基板处理装置

Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus
Abstract:
A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.
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