Invention Grant
US08851274B2 Substrate treatment system 有权
基材处理系统

Substrate treatment system
Abstract:
A substrate treatment system for treating substrates includes a system chamber, delimited by chamber walls, at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. At least a first group of transportation rollers which are arranged immediately one behind the other, each has its own drive device.
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