Invention Grant
US08851816B2 Apparatus, system, and methods for weighing and positioning wafers
有权
用于称重和定位晶圆的装置,系统和方法
- Patent Title: Apparatus, system, and methods for weighing and positioning wafers
- Patent Title (中): 用于称重和定位晶圆的装置,系统和方法
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Application No.: US13436848Application Date: 2012-03-31
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Publication No.: US08851816B2Publication Date: 2014-10-07
- Inventor: Reiner G. Fenske , David S. Denu
- Applicant: Reiner G. Fenske , David S. Denu
- Applicant Address: US MA Edgartown
- Assignee: Microtronic, Inc.
- Current Assignee: Microtronic, Inc.
- Current Assignee Address: US MA Edgartown
- Agency: Patent Innovations LLC
- Agent John M. Hammond
- Main IPC: B65H5/08
- IPC: B65H5/08 ; G01G19/00 ; G01G19/52 ; G01G21/22

Abstract:
An apparatus for characterizing a wafer comprising an aligner comprising a chuck for receiving and rotating the wafer, a sensor for detecting the position of the wafer as it is rotated, a first actuator for lowering and raising the wafer vertically, and a second actuator for moving the chuck horizontally; and a weighing scale comprising a weight sensor disposed proximate to the aligner, and a cantilevered arm extending laterally from the weight sensor over the chuck of the aligner, the cantilevered arm having a through hole surrounding the chuck. The chuck is vertically movable relative to the weighing scale from a first position in which the wafer is supported by the chuck to a second position in which the wafer is supported by the cantilevered arm of the weighing scale. A method for characterizing a wafer using the instant apparatus is also disclosed.
Public/Granted literature
- US20120255794A1 APPARATUS, SYSTEM, AND METHOD FOR WAFER CHARACTERIZATION Public/Granted day:2012-10-11
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