Invention Grant
- Patent Title: Method for recovering tantalum
- Patent Title (中): 钽回收方法
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Application No.: US13635890Application Date: 2011-03-24
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Publication No.: US08852317B2Publication Date: 2014-10-07
- Inventor: Mami Yoshida , Kenji Matsuzaki , Tatsuya Aoki , Rintaro Ishii
- Applicant: Mami Yoshida , Kenji Matsuzaki , Tatsuya Aoki , Rintaro Ishii
- Applicant Address: JP Tokyo
- Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JP2010-084726 20100401
- International Application: PCT/JP2011/057119 WO 20110324
- International Announcement: WO2011/125510 WO 20111013
- Main IPC: C22B34/24
- IPC: C22B34/24 ; C22B3/12 ; C22B7/00 ; C22B3/10 ; C22B3/06

Abstract:
The present invention provides a technology for recovering high-content tantalum from tantalum-containing waste with reducing various impurities such as antimony (Sb) and phosphorus (P) which hinder reuse of the tantalum in tantalum capacitors. The method for recovering tantalum from tantalum-containing waste according to the present invention is characterized in that tantalum-containing waste is subjected to an acid treatment and then to an alkali treatment, thereby recovering tantalum. The acid treatment is preferably performed with use of an acid containing hydrochloric acid and the alkali treatment is preferably performed with use of sodium hydroxide or potassium hydroxide. The tantalum-containing waste in the present invention is preferably a tantalum sintered compact collected from a tantalum capacitor.
Public/Granted literature
- US20130014611A1 METHOD FOR RECOVERING TANTALUM Public/Granted day:2013-01-17
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