Invention Grant
US08852520B2 Plasma reactor for abating hazardous materials and driving method thereof
有权
用于减轻有害物质的等离子体反应器及其驱动方法
- Patent Title: Plasma reactor for abating hazardous materials and driving method thereof
- Patent Title (中): 用于减轻有害物质的等离子体反应器及其驱动方法
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Application No.: US12905227Application Date: 2010-10-15
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Publication No.: US08852520B2Publication Date: 2014-10-07
- Inventor: Min Hur , Min-Suk Cha , Young-Hoon Song , Jae-Ok Lee , Dae-Hoon Lee , Kwan-Tae Kim
- Applicant: Min Hur , Min-Suk Cha , Young-Hoon Song , Jae-Ok Lee , Dae-Hoon Lee , Kwan-Tae Kim
- Applicant Address: KR Daejeon
- Assignee: Korea Institute of Machinery & Materials
- Current Assignee: Korea Institute of Machinery & Materials
- Current Assignee Address: KR Daejeon
- Agency: Pearl Cohen Zedek Latzer Baratz LLP
- Priority: KR10-2009-0098892 20091016; KR10-2010-0091074 20100916
- Main IPC: B01J19/08
- IPC: B01J19/08 ; H01J37/32 ; B01D53/32 ; H05H1/24
Abstract:
The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.
Public/Granted literature
- US20110089017A1 PLASMA REACTOR FOR ABATING HAZARDOUS MATERIALS AND DRIVING METHOD THEREOF Public/Granted day:2011-04-21
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