Invention Grant
- Patent Title: Surfaces having particles and related methods
- Patent Title (中): 具有颗粒和相关方法的表面
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Application No.: US12601869Application Date: 2008-05-29
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Publication No.: US08852689B2Publication Date: 2014-10-07
- Inventor: Arjun Daniel Srinivas , Calvin Peng , Alexander Chow Mittal , Priyanka Agarwal
- Applicant: Arjun Daniel Srinivas , Calvin Peng , Alexander Chow Mittal , Priyanka Agarwal
- Applicant Address: US CA San Francisco
- Assignee: Innova Dynamics, Inc.
- Current Assignee: Innova Dynamics, Inc.
- Current Assignee Address: US CA San Francisco
- Agency: Foley & Lardner LLP
- Agent Cliff Z. Liu
- International Application: PCT/US2008/065083 WO 20080529
- International Announcement: WO2008/150867 WO 20081211
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B29C59/02 ; C08J7/04 ; G01N33/48 ; A01N25/34 ; C08J7/02 ; A01N59/16 ; B05D7/02 ; B05D3/00
Abstract:
Particles are embedded in a substrate by applying to at least a portion of the substrate a fluid and a population of particles, such that the substrate is softened to at least a degree that particles are at least partially embedded in the softened portion of the substrate. The softened portion of the substrate is hardened so as to securely embed the particles in the substrate.
Public/Granted literature
- US20100230344A1 SURFACES HAVING PARTICLES AND RELATED METHODS Public/Granted day:2010-09-16
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