Invention Grant
US08852845B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin
有权
光敏感或辐射敏感性树脂组合物，抗蚀剂膜，使用其的图案形成方法和树脂
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin
- Patent Title (中): 光敏感或辐射敏感性树脂组合物，抗蚀剂膜，使用其的图案形成方法和树脂
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Application No.: US12641877Application Date: 2009-12-18
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Publication No.: US08852845B2Publication Date: 2014-10-07
- Inventor: Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
- Applicant: Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-322678 20081218
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039
Abstract:
Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: wherein each of R1a to R13a independently represents a hydrogen atom or a monovalent substituent and may combine together to form a ring, and Z represents a single bond or a divalent linking group.
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