Invention Grant
US08852965B2 Method of making semiconductor having superhydrophilic principal surface and method of arranging particles thereon
有权
制造具有超亲水性主面的半导体的方法和在其上排列颗粒的方法
- Patent Title: Method of making semiconductor having superhydrophilic principal surface and method of arranging particles thereon
- Patent Title (中): 制造具有超亲水性主面的半导体的方法和在其上排列颗粒的方法
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Application No.: US14047456Application Date: 2013-10-07
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Publication No.: US08852965B2Publication Date: 2014-10-07
- Inventor: Masaki Fujikane , Akira Inoue , Toshiya Yokogawa
- Applicant: Panasonic Corporation
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C30B29/40 ; H01L21/02 ; H01L21/306 ; C30B33/00

Abstract:
The terminating layer that covers the top layer of a GaN-based semiconductor having a principal surface which is either a non-polar plane or a semi-polar plane, is removed by performing an organic solvent cleaning process step, and replaced with an organic solvent cleaned layer. Next, by irradiating the semiconductor with an ultraviolet ray, the organic solvent cleaned layer is removed to form a surface-modified layer instead. By performing these process steps, the top layer of the GaN-based semiconductor becomes the surface-modified layer and an electrical polarity is given to the surface of the GaN-based semiconductor. As a result, the hydrophilicity, hydrophobicity and wettability of the GaN-based semiconductor can be controlled.
Public/Granted literature
- US20140034961A1 SURFACE-MODIFIED SEMICONDUCTOR, METHOD OF MAKING THE SEMICONDUCTOR, AND METHOD OF ARRANGING PARTICLES Public/Granted day:2014-02-06
Information query
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