Invention Grant
- Patent Title: Absorber layer for a thin film photovoltaic device with a double-graded band gap
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Application No.: US14187029Application Date: 2014-02-21
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Publication No.: US08852993B2Publication Date: 2014-10-07
- Inventor: Haifan Liang
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18

Abstract:
A gallium-containing alloy is formed on the light-receiving surface of a CIGS absorber layer, and, in conjunction with a subsequent selenization or anneal process, is converted to a gallium-rich region at the light-receiving surface of the CIGS absorber layer. A second gallium-rich region is formed at the back contact surface of the CIGS absorber layer during selenization, so that the CIGS absorber layer has a double-graded gallium concentration that increases toward the light-receiving surface and toward the back contact surface of the CIGS absorber layer. The double-graded gallium concentration advantageously produces a double-graded bandgap profile for the CIGS absorber layer.
Public/Granted literature
- US20140170802A1 Absorber Layer for a Thin Film Photovoltaic Device With a Double-Graded Band Gap Public/Granted day:2014-06-19
Information query
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