Invention Grant
- Patent Title: Method of depositing material
- Patent Title (中): 材料沉积方法
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Application No.: US13017015Application Date: 2011-01-30
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Publication No.: US08853078B2Publication Date: 2014-10-07
- Inventor: Aurelien Philippe Jean Maclou Botman , Steven Randolph , Milos Toth
- Applicant: Aurelien Philippe Jean Maclou Botman , Steven Randolph , Milos Toth
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; Ki O
- Main IPC: H01L21/44
- IPC: H01L21/44 ; C23C16/10 ; C23C16/48 ; C23C16/14
Abstract:
Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
Public/Granted literature
- US20120196440A1 Method of Depositing Material Public/Granted day:2012-08-02
Information query
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