Invention Grant
US08853345B2 Polymer, method for producing the same, and resist composition containing the same
有权
聚合物，其制造方法和含有该聚合物的抗蚀剂组合物
- Patent Title: Polymer, method for producing the same, and resist composition containing the same
- Patent Title (中): 聚合物，其制造方法和含有该聚合物的抗蚀剂组合物
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Application No.: US13330971Application Date: 2011-12-20
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Publication No.: US08853345B2Publication Date: 2014-10-07
- Inventor: Jung-Hoon Oh , Joon Hee Han , Tae Gon Kim , Hyun Sang Joo
- Applicant: Jung-Hoon Oh , Joon Hee Han , Tae Gon Kim , Hyun Sang Joo
- Applicant Address: KR Seoul
- Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Davidson, Davidson & Kappel, LLC
- Priority: KR10-2010-0134284 20101224
- Main IPC: C08G63/668
- IPC: C08G63/668 ; G03F7/20 ; G03F7/039
Abstract:
Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.
Public/Granted literature
- US20120165499A1 POLYMER, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME Public/Granted day:2012-06-28
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