Invention Grant
- Patent Title: Beam regulating apparatus for an EUV illumination beam
- Patent Title (中): 用于EUV照明光束的光束调节装置
-
Application No.: US13843753Application Date: 2013-03-15
-
Publication No.: US08853642B2Publication Date: 2014-10-07
- Inventor: Ralf Arnold , Ulrich Mueller
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102012204674 20120323
- Main IPC: G01J1/42
- IPC: G01J1/42 ; G03F1/84 ; G03F7/20 ; G02B26/00

Abstract:
A beam regulating apparatus for an EUV illumination beam has a position sensor device and a control/regulating device, which is signal-connected to the position sensor device. Furthermore, at least one beam regulating component which influences the beam path of the illumination beam is signal-connected to the control/regulating device. The position sensor device has at least one diffraction grating for generating at least two reference partial beams from the illumination beam. Furthermore, the position sensor device has a respective position sensor assigned to one of the reference partial beams, for detecting the assigned reference partial beam. This results in a beam regulating apparatus which enables well-controllable illumination in conjunction with a simple construction.
Public/Granted literature
- US20130248728A1 BEAM REGULATING APPARATUS FOR AN EUV ILLUMINATION BEAM Public/Granted day:2013-09-26
Information query