Invention Grant
US08853662B2 Self-aligned process to fabricate a memory cell array with a surrounding-gate access transistor 有权
自对准工艺制造具有周围栅极存取晶体管的存储单元阵列

Self-aligned process to fabricate a memory cell array with a surrounding-gate access transistor
Abstract:
A memory array including a plurality of memory cells. Each word line is electrically coupled to a set of memory cells, a gate contact and a pair of dielectric pillars positioned parallel to the word line. Dielectric pillars are placed on both sides of the gate contact. Also a method to prevent a gate contact from electrically connecting to a source contact for a plurality of memory cells on a substrate. The method includes formation of a pair of pillars made of an insulating material over the substrate, depositing an electrically conductive gate material between and over the pillars, etching the gate material such that it both partially fills a space between the pair of pillars and forms a word line for the memory cells, and depositing a gate contact between the dielectric pillars such that the gate contact is in electrical contact with the gate material.
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