Invention Grant
- Patent Title: Gallium nitride substrate and epitaxial wafer
- Patent Title (中): 氮化镓衬底和外延晶片
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Application No.: US13794539Application Date: 2013-03-11
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Publication No.: US08853672B2Publication Date: 2014-10-07
- Inventor: Shunsuke Yamamoto
- Applicant: Hitachi Cable, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2012-069353 20120326
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/20 ; H01L21/02

Abstract:
A gallium nitride substrate includes a plurality of physical level differences in a surface thereof. All the physical level differences existing in the surface have a dimension of not more than 4 μm. A relationship of (H−L)/H×100≦80 is satisfied in all the physical level differences, where H represents a higher value of cathodoluminescence emission intensities of a wavelength corresponding to a bandgap of the gallium nitride substrate, and L represents a lower value of the cathodoluminescence emission intensities, the cathodoluminescence emission intensities being measured in an upper step and a lower step of the physical level difference.
Public/Granted literature
- US20130248820A1 GALLIUM NITRIDE SUBSTRATE AND EPITAXIAL WAFER Public/Granted day:2013-09-26
Information query
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