Invention Grant
- Patent Title: Semiconductor device with oxide semiconductor layer
- Patent Title (中): 具有氧化物半导体层的半导体器件
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Application No.: US13743546Application Date: 2013-01-17
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Publication No.: US08853690B2Publication Date: 2014-10-07
- Inventor: Shunpei Yamazaki , Hiromichi Godo , Hideyuki Kishida
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2009-100119 20090416
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L27/12 ; H01L29/786 ; H01L21/02

Abstract:
An object is to provide a transistor including an oxide layer which includes Zn and does not include a rare metal such as In or Ga. Another object is to reduce an off current and stabilize electric characteristics in the transistor including an oxide layer which includes Zn. A transistor including an oxide layer including Zn is formed by stacking an oxide semiconductor layer including insulating oxide over an oxide layer so that the oxide layer is in contact with a source electrode layer or a drain electrode layer with the oxide semiconductor layer including insulating oxide interposed therebetween, whereby variation in the threshold voltage of the transistor can be reduced and electric characteristics can be stabilized.
Public/Granted literature
- US20130126863A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-05-23
Information query
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