Invention Grant
- Patent Title: SRAM memory cell having a dogleg shaped gate electrode structure
- Patent Title (中): SRAM存储单元具有狗形栅电极结构
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Application No.: US11593290Application Date: 2006-11-06
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Publication No.: US08853791B2Publication Date: 2014-10-07
- Inventor: Uwe Paul Schroeder , Martin Ostermayr
- Applicant: Uwe Paul Schroeder , Martin Ostermayr
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L27/07
- IPC: H01L27/07 ; G11C11/412 ; H01L27/11

Abstract:
A memory cell includes diffusion regions formed in a substrate. Each of the diffusion regions extends along a vertical direction in a layout view at a substrate level. A first gate electrode structure at a gate electrode level is generally dogleg shaped. The first gate electrode structure extends in an oblique direction, turns to a horizontal direction, extends over and crosses the diffusion regions in the horizontal direction. A first contact structure at a contact level is generally rectangular shaped in the layout view of the cell. The first contact structure electrically connects a first source/drain region of the first diffusion region to the first gate electrode structure and the first source/drain region of the second diffusion region. The first contact structure extends from the first source/drain region of the first diffusion region to the first source/drain region of the second diffusion region at the contact level.
Public/Granted literature
- US20080122008A1 Memory cell Public/Granted day:2008-05-29
Information query
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