Invention Grant
- Patent Title: MEMS devices and fabrication thereof
- Patent Title (中): MEMS器件及其制造
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Application No.: US12990123Application Date: 2009-05-06
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Publication No.: US08853797B2Publication Date: 2014-10-07
- Inventor: Robertus T. F. van Schaijk
- Applicant: Robertus T. F. van Schaijk
- Applicant Address: NL Eindhoven
- Assignee: NXP, B.V
- Current Assignee: NXP, B.V
- Current Assignee Address: NL Eindhoven
- Priority: EP08103929 20080512
- International Application: PCT/IB2009/051859 WO 20090506
- International Announcement: WO2009/138906 WO 20091119
- Main IPC: H01L27/12
- IPC: H01L27/12 ; B81B3/00

Abstract:
A MEMS device and method, comprising: a substrate; a beam; and a cavity located therebetween; the beam comprising a first beam layer and a second beam layer, the first beam layer being directly adjacent to the cavity, the second beam layer being directly adjacent to the first beam layer; the first beam layer comprising a metal or a metal alloy containing silicon; and the second beam layer comprising a metal or a metal alloy substantially not containing silicon. Preferably the second beam layer is thicker than the first beam layer e.g. at least five times thicker, and the first beam layer comprises a metal or alloy containing between 1% and 2% of silicon. The second beam layer provides desired mechanical and/or optical properties while the first beam layer prevents spiking.
Public/Granted literature
- US20110260267A1 MEMS DEVICES AND FABRICATION THEREOF Public/Granted day:2011-10-27
Information query
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