Invention Grant
US08853800B2 Integrated device of the type comprising at least a microfluidic system and further circuitry and corresponding integration process
有权
该类型的集成装置至少包括微流体系统和进一步的电路和相应的集成过程
- Patent Title: Integrated device of the type comprising at least a microfluidic system and further circuitry and corresponding integration process
- Patent Title (中): 该类型的集成装置至少包括微流体系统和进一步的电路和相应的集成过程
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Application No.: US13178076Application Date: 2011-07-07
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Publication No.: US08853800B2Publication Date: 2014-10-07
- Inventor: Claudia Caligiore , Salvatore Leonardi , Salvatore Baglio , Bruno Ando′
- Applicant: Claudia Caligiore , Salvatore Leonardi , Salvatore Baglio , Bruno Ando′
- Applicant Address: IT Agrate Brianza (MB)
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza (MB)
- Agency: Graybeal Jackson LLP
- Priority: ITMI2010A1258 20100707
- Main IPC: H01L29/84
- IPC: H01L29/84 ; B81C1/00
Abstract:
An embodiment relates to a device integrated on a semiconductor substrate of a type comprising at least one first portion for the integration of at least one microfluidic system, and a second portion for the integration of an additional circuitry. The microfluidic system comprises at least one cavity realized in a containment layer of the integrated device closed on top by at least one portion of a polysilicon layer, this polysilicon layer being a thin layer shared by the additional circuitry and the closing portion of the cavity realizing a piezoresistive membrane for the microfluidic system.
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