Invention Grant
- Patent Title: Exposure device and image forming apparatus
- Patent Title (中): 曝光装置和图像形成装置
-
Application No.: US13214889Application Date: 2011-08-22
-
Publication No.: US08854410B2Publication Date: 2014-10-07
- Inventor: Jiro Minabe , Keishi Shimizu , Mihoko Wakui , Yasuhiro Ogasawara , Kazuhiro Hayashi , Akira Tateishi , Shin Yasuda , Motoki Taniguchi
- Applicant: Jiro Minabe , Keishi Shimizu , Mihoko Wakui , Yasuhiro Ogasawara , Kazuhiro Hayashi , Akira Tateishi , Shin Yasuda , Motoki Taniguchi
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-059685 20110317
- Main IPC: B41J15/14
- IPC: B41J15/14 ; B41J27/00 ; G02B5/32 ; G03G15/043 ; G03G15/04

Abstract:
An exposure device includes at least one light emitting element that emits light in a normal direction of the substrate; at least one hologram element that is recorded on a recording layer arranged on the substrate to diffract light emitted from the light emitting element and condense the diffracted light on a condensing point on a normal line of the light emitting element; and at least one light inhibiting part that is arranged on a straight line that connects the light emitting element and the condensing point such that the light diffracted by the hologram element passes through the outside of the light inhibiting part and condenses at the condensing point, to inhibit transmission of zeroth-order light that goes straight toward the condensing point from the light emitting element without being diffracted by the hologram element.
Public/Granted literature
- US20120236280A1 EXPOSURE DEVICE AND IMAGE FORMING APPARATUS Public/Granted day:2012-09-20
Information query
IPC分类: