Invention Grant
US08854599B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
有权
液体回收装置，曝光装置，曝光方法及装置制造方法
- Patent Title: Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
- Patent Title (中): 液体回收装置，曝光装置，曝光方法及装置制造方法
-
Application No.: US12923568Application Date: 2010-09-28
-
Publication No.: US08854599B2Publication Date: 2014-10-07
- Inventor: Hideaki Hara , Hiroaki Takaiwa , Dai Arai
- Applicant: Hideaki Hara , Hiroaki Takaiwa , Dai Arai
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2003-307771 20030829; JP2004-150353 20040520
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally.
Public/Granted literature
- US20110013161A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Public/Granted day:2011-01-20
Information query
IPC分类:
