Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and device fabrication method
- Patent Title (中): 照明光学系统,曝光装置和装置制造方法
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Application No.: US12685309Application Date: 2010-01-11
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Publication No.: US08854605B2Publication Date: 2014-10-07
- Inventor: Ken Minoda
- Applicant: Ken Minoda
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-031964 20090213
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03F7/20

Abstract:
The present invention provides an illumination optical system which illuminates an illumination target surface with a light beam from a light source, the system including a plurality of adjustment units each having one of a reflectance distribution and a transmittance distribution to adjust an incident angle distribution of the light beam which impinges on the illumination target surface, the plurality of adjustment units including an adjustment unit which adjusts differences between light amounts, in a first direction, of incident angle distributions of light beams at a plurality of points on the illumination target surface, and light amounts, in a second direction, thereof, and an adjustment unit which adjusts at least one of light amount differences, in the first direction, of the incident angle distributions of the light beams at the plurality of points on the illumination target surface, and light amount differences, in the second direction, thereof.
Public/Granted literature
- US20100208223A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2010-08-19
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