发明授权
- 专利标题： Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
- 专利标题（中）： 投影曝光系统，借助于这种投影曝光系统和适于在这种系统中使用的偏振光学元件制造微结构结构构件的方法
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申请号： US13161011申请日： 2011-06-15
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公开(公告)号： US08854606B2公开(公告)日： 2014-10-07
- 发明人: Hans-Jürgen Mann , Wolfgang Singer , Toralf Gruner , Olaf Dittmann , Michael Totzeck
- 申请人： Hans-Jürgen Mann , Wolfgang Singer , Toralf Gruner , Olaf Dittmann , Michael Totzeck
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/54 ; G03F7/20
摘要：
The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.