Invention Grant
- Patent Title: Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method
- Patent Title (中): 控制器，光刻设备，物体位置控制方法及装置的制造方法
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Application No.: US13275737Application Date: 2011-10-18
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Publication No.: US08854607B2Publication Date: 2014-10-07
- Inventor: Ramidin Izair Kamidi , Hans Butler , Martijn Houkes , Marinus Maria Johannes Van De Wal , Jeroen Johan Maarten Van De Wijdeven
- Applicant: Ramidin Izair Kamidi , Hans Butler , Martijn Houkes , Marinus Maria Johannes Van De Wal , Jeroen Johan Maarten Van De Wijdeven
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62 ; G05B19/402 ; G03F7/20
Abstract:
A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the center of gravity of the object into a second control signal, representing an equivalent set of forces to be provided by the plurality of actuators. The system is further configured such that a first gain balancing matrix is used at a first frequency band and a second gain balancing matrix is used at a second frequency band.
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