Invention Grant
- Patent Title: Surface defect inspection apparatus and surface defect inspection method
- Patent Title (中): 表面缺陷检查装置和表面缺陷检查方法
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Application No.: US13352663Application Date: 2012-01-18
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Publication No.: US08854613B2Publication Date: 2014-10-07
- Inventor: Katsumi Fujihara
- Applicant: Katsumi Fujihara
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Staas & Halsey LLP
- Priority: JP2011-063094 20110322
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/94 ; G01N21/95 ; G01N21/88

Abstract:
A surface defect inspection apparatus includes a light source that emits light to a first position on a surface of a target at an angle inclined with respect to the surface of the target, a first photodetector that detects first reflected light of the light from the light source, the first reflected light being reflected at the first position, a second photodetector that detects second reflected light of the light from the light source, the second reflected light being reflected at a second position, the second position being closer to the light source than the first position and being separated from the surface of the target by a given distance, and a determining unit that determines whether or not foreign matter is present on the surface of the target on a basis of detection results obtained from the first photodetector and the second photodetector.
Public/Granted literature
- US20120242984A1 SURFACE DEFECT INSPECTION APPARATUS AND SURFACE DEFECT INSPECTION METHOD Public/Granted day:2012-09-27
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