Invention Grant
US08854625B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
有权
包括颗粒监测单元,颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
- Patent Title: Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
- Patent Title (中): 包括颗粒监测单元,颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
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Application No.: US12985099Application Date: 2011-01-05
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Publication No.: US08854625B2Publication Date: 2014-10-07
- Inventor: Tsuyoshi Moriya , Hiroyuki Nakayama
- Applicant: Tsuyoshi Moriya , Hiroyuki Nakayama
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2004-096456 20040329; JP2004-329675 20041112
- Main IPC: G01N21/00
- IPC: G01N21/00 ; C23C14/00 ; H01J37/32 ; B08B9/08 ; G01N15/02 ; G01N15/06

Abstract:
A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.
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