Invention Grant
US08854628B2 Interferometric methods for metrology of surfaces, films and underresolved structures
有权
用于测量表面，薄膜和欠解析结构的干涉测量方法
- Patent Title: Interferometric methods for metrology of surfaces, films and underresolved structures
- Patent Title (中): 用于测量表面，薄膜和欠解析结构的干涉测量方法
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Application No.: US13238732Application Date: 2011-09-21
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Publication No.: US08854628B2Publication Date: 2014-10-07
- Inventor: Xavier M. Colonna de Lega , Peter J. de Groot , Jan Liesener
- Applicant: Xavier M. Colonna de Lega , Peter J. de Groot , Jan Liesener
- Applicant Address: US CT Middlefield
- Assignee: Zygo Corporation
- Current Assignee: Zygo Corporation
- Current Assignee Address: US CT Middlefield
- Agency: Fish & Richardson P.C.
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01B11/02 ; G01N21/41 ; G01N21/43 ; G01N21/21 ; G01N21/45 ; G01N21/47 ; G01B11/06
Abstract:
A method for determining information about a test object includes combining two or more scanning interference signals to form a synthetic interference signal; analyzing the synthetic interference signal to determine information about the test object; and outputting the information about the test object. Each of the two or more scanning interference signals correspond to interference between test light and reference light as an optical path length difference between the test and reference light is scanned, wherein the test and reference light are derived from a common source. The test light scatters from the test object over a range of angles and each of the two or more scanning interferometry signals corresponds to a different scattering angle or polarization state of the test light.
Public/Granted literature
- US20120069326A1 INTERFEROMETRIC METHODS FOR METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES Public/Granted day:2012-03-22
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