发明授权
US08856693B2 Method for designing optical lithography masks for directed self-assembly
有权
用于定向自组装的光学光刻掩模的设计方法
- 专利标题: Method for designing optical lithography masks for directed self-assembly
- 专利标题(中): 用于定向自组装的光学光刻掩模的设计方法
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申请号: US13606055申请日: 2012-09-07
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公开(公告)号: US08856693B2公开(公告)日: 2014-10-07
- 发明人: Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Jed Walter Pitera , Charles Thomas Rettner , Daniel Paul Sanders , Da Yang
- 申请人: Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Jed Walter Pitera , Charles Thomas Rettner , Daniel Paul Sanders , Da Yang
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Schmeiser, Olsen & Watts
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G03F7/00 ; G03F1/38
摘要:
A method and a computer system for designing an optical photomask for forming a prepattern opening in a photoresist layer on a substrate wherein the photoresist layer and the prepattern opening are coated with a self-assembly material that undergoes directed self-assembly to form a directed self-assembly pattern. The methods includes: generating a mask design shape from a target design shape; generating a sub-resolution assist feature design shape based on the mask design shape; using a computer to generate a prepattern shape based on the sub-resolution assist feature design shape; and using a computer to evaluate if a directed self-assembly pattern of the self-assembly material based on the prepattern shape is within specified ranges of dimensional and positional targets of the target design shape on the substrate.