Invention Grant
- Patent Title: Methods of forming photo detectors
- Patent Title (中): 形成光电检测器的方法
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Application No.: US13612736Application Date: 2012-09-12
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Publication No.: US08859319B2Publication Date: 2014-10-14
- Inventor: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
- Applicant: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Priority: KR10-2011-0130309 20111207
- Main IPC: H01L31/18
- IPC: H01L31/18

Abstract:
Methods of forming photo detectors are provided. The method includes providing a semiconductor layer on a substrate, forming a trench in the semiconductor layer, forming a first single crystalline layer and a second single crystalline layer using a selective single crystalline growth process in the trench, and patterning the first and second single crystalline layers and the semiconductor layer to form a first single crystalline pattern, a second single crystalline pattern and an optical waveguide.
Public/Granted literature
- US20130149806A1 METHODS OF FORMING PHOTO DETECTORS Public/Granted day:2013-06-13
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