Invention Grant
- Patent Title: Method of manufacturing resistor
- Patent Title (中): 制造电阻的方法
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Application No.: US13681435Application Date: 2012-11-20
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Publication No.: US08871049B2Publication Date: 2014-10-28
- Inventor: Ta-Wen Lo
- Applicant: Cyntec Co., Ltd.
- Applicant Address: TW Science-Based Industrial Park, Hsinchu
- Assignee: Cyntec Co., Ltd.
- Current Assignee: Cyntec Co., Ltd.
- Current Assignee Address: TW Science-Based Industrial Park, Hsinchu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01C17/28
- IPC: H01C17/28 ; H01C1/144

Abstract:
A method of manufacturing a resistor includes steps of providing a resistance material and two electrode materials, wherein a reflectivity of the resistance material is smaller than a reflectivity of the electrode material; fixing the two electrode materials at opposite sides of the resistance material; and welding two first junctions between the resistance material and the two electrode materials by a first laser from a first side of the resistance material, wherein a beam area from the first laser to the resistance material is larger than a beam area from the first laser to the electrode material.
Public/Granted literature
- US20130133826A1 METHOD OF MANUFACTURING RESISTOR Public/Granted day:2013-05-30
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