Invention Grant
US08871049B2 Method of manufacturing resistor 有权
制造电阻的方法

  • Patent Title: Method of manufacturing resistor
  • Patent Title (中): 制造电阻的方法
  • Application No.: US13681435
    Application Date: 2012-11-20
  • Publication No.: US08871049B2
    Publication Date: 2014-10-28
  • Inventor: Ta-Wen Lo
  • Applicant: Cyntec Co., Ltd.
  • Applicant Address: TW Science-Based Industrial Park, Hsinchu
  • Assignee: Cyntec Co., Ltd.
  • Current Assignee: Cyntec Co., Ltd.
  • Current Assignee Address: TW Science-Based Industrial Park, Hsinchu
  • Agent Winston Hsu; Scott Margo
  • Main IPC: H01C17/28
  • IPC: H01C17/28 H01C1/144
Method of manufacturing resistor
Abstract:
A method of manufacturing a resistor includes steps of providing a resistance material and two electrode materials, wherein a reflectivity of the resistance material is smaller than a reflectivity of the electrode material; fixing the two electrode materials at opposite sides of the resistance material; and welding two first junctions between the resistance material and the two electrode materials by a first laser from a first side of the resistance material, wherein a beam area from the first laser to the resistance material is larger than a beam area from the first laser to the electrode material.
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