发明授权
- 专利标题： Illumination system for use in a stereolithography apparatus
- 专利标题（中）： 用于立体光刻设备的照明系统
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申请号： US13254567申请日： 2010-03-08
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公开(公告)号： US08873024B2公开(公告)日： 2014-10-28
- 发明人: Jacobus Hubertus Theodoor Jamar , Herman Hendrikus Maalderink , Andries Rijfers , Borgert Kruizinga , Jentske D. Kooistra
- 申请人： Jacobus Hubertus Theodoor Jamar , Herman Hendrikus Maalderink , Andries Rijfers , Borgert Kruizinga , Jentske D. Kooistra
- 申请人地址： NL Delft
- 专利权人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
- 当前专利权人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
- 当前专利权人地址： NL Delft
- 代理机构： Swanson & Bratschun, L.L.C.
- 优先权： EP09154568 20090306
- 国际申请： PCT/NL2010/050115 WO 20100308
- 国际公布： WO2010/101465 WO 20100910
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; B29C67/00 ; G03F7/20
摘要：
The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.
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