Invention Grant
- Patent Title: Thin film transistor substrate and method for manufacturing the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US14047501Application Date: 2013-10-07
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Publication No.: US08877573B2Publication Date: 2014-11-04
- Inventor: KiTae Kim
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2010-0123715 20101206
- Main IPC: H01L21/268
- IPC: H01L21/268 ; H01L29/66 ; H01L21/02 ; H01L27/12

Abstract:
A thin film transistor substrate and a method for manufacturing the same are discussed, in which the thin film transistor comprises a gate line and a data line arranged on a substrate to cross each other; a gate electrode connected with the gate line below the gate line; an active layer formed on the gate electrode; an etch stopper formed on the active layer; an ohmic contact layer formed on the etch stopper; source and drain electrodes formed on the ohmic contact layer; and a pixel electrode connected with the drain electrode. It is possible to prevent a crack from occurring in the gate insulating film during irradiation of the laser and prevent resistance of the gate electrode from being increased.
Public/Granted literature
- US20140038370A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-02-06
Information query
IPC分类: