发明授权
US08879159B2 Lithography projection objective, and a method for correcting image defects of the same
有权
平版印刷投影物镜，以及用于校正图像缺陷的方法
- 专利标题： Lithography projection objective, and a method for correcting image defects of the same
- 专利标题（中）： 平版印刷投影物镜，以及用于校正图像缺陷的方法
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申请号： US13245116申请日： 2011-09-26
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公开(公告)号： US08879159B2公开(公告)日： 2014-11-04
- 发明人: Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- 申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G02B9/00
- IPC分类号： G02B9/00 ; G03B27/42 ; G03F7/00 ; G03F7/20
摘要：
The disclosure provides a microlithography projection objective which includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes a last optical element and a penultimate optical element. A distance between the last optical element and the penultimate optical element is variable. The disclosure also provides a microlithography projection exposure machine including such a projection objective, and a method of making semiconductor components using such a projection exposure machine.