发明授权
US08880210B2 Methods and apparatus for processing substrates using model-based control
有权
使用基于模型的控制处理基板的方法和装置
- 专利标题: Methods and apparatus for processing substrates using model-based control
- 专利标题(中): 使用基于模型的控制处理基板的方法和装置
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申请号: US13183520申请日: 2011-07-15
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公开(公告)号: US08880210B2公开(公告)日: 2014-11-04
- 发明人: Keith Brian Porthouse , John W. Lane , Mariusch Gregor , Nir Merry , Michael R. Rice , Alex Minkovich , Hongbin Li , Dmitry A. Dzilno
- 申请人: Keith Brian Porthouse , John W. Lane , Mariusch Gregor , Nir Merry , Michael R. Rice , Alex Minkovich , Hongbin Li , Dmitry A. Dzilno
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Moser Taboada
- 代理商 Alan Taboada
- 主分类号: G06F19/00
- IPC分类号: G06F19/00 ; G05B17/02 ; H01L21/67 ; G05D16/20
摘要:
Methods and apparatus are disclosed herein. In some embodiments, methods of controlling process chambers may include predetermining a relationship between pressure in a processing volume and a position of an exhaust valve as a function of a process parameter; setting the process chamber to a first state having a first pressure in the processing volume and a first value of the process parameter, wherein the exhaust valve is set to a first position based on the predetermined relationship to produce the first pressure at the first value; determining a pressure control profile to control the pressure as the process chamber is changed to a second state having a second pressure and a second process parameter value from the first state; and applying the pressure control profile to control the pressure by varying the position of the exhaust valve while changing the process chamber to the second state.