- 专利标题: Analyzing a patterning process using a model of yield
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申请号: US13352713申请日: 2012-01-18
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公开(公告)号: US08880382B2公开(公告)日: 2014-11-04
- 发明人: Saeed Bagheri , Fook-Luen Heng , Rajiv Vasant Joshi , Kafai Lai , David Osmond Melville , Saibal Mukhopadhyay , Alan E Rosenbluth , Rama N. Singh , Kehan Tian
- 申请人: Saeed Bagheri , Fook-Luen Heng , Rajiv Vasant Joshi , Kafai Lai , David Osmond Melville , Saibal Mukhopadhyay , Alan E Rosenbluth , Rama N. Singh , Kehan Tian
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Harrington & Smith
- 主分类号: G06G7/48
- IPC分类号: G06G7/48
摘要:
Techniques are presented that include accessing results of forward simulations of circuit yield, the results including at least circuit yield results including simulated device shapes. Using the circuit yield results, high-level traits of at least the simulated device shapes are determined. Based on the determined high-level traits and using the circuit yield results, a compact model for predicted yield is constructed, the compact model including a plurality of adjustable parameters, and the constructing the compact model for predicted yield including adjusting the adjustable parameters until at least one first predetermined criterion is met. An optimization problem is constructed including at least the compact model for yield, an objective, and a plurality of constraints. Using the optimization problem, the objective is modified subject to the plurality of constraints until at least one second predetermined criterion is met.
公开/授权文献
- US20130185045A1 ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD 公开/授权日:2013-07-18
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