发明授权
- 专利标题: Coating structure and method for forming the same
- 专利标题(中): 涂层结构及其形成方法
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申请号: US13371825申请日: 2012-02-13
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公开(公告)号: US08883296B2公开(公告)日: 2014-11-11
- 发明人: Byung Ha Park , Sang Ho Cho , Myung Gon Kim , Ki Yong Song , Cheol Ham , In Oh Hwang
- 申请人: Byung Ha Park , Sang Ho Cho , Myung Gon Kim , Ki Yong Song , Cheol Ham , In Oh Hwang
- 申请人地址: KR Suwon-Si
- 专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si
- 代理机构: Staas & Halsey LLP
- 优先权: KR10-2011-0128854 20111205
- 主分类号: B32B7/02
- IPC分类号: B32B7/02 ; B32B3/00 ; B32B9/04 ; C23C16/22
摘要:
A coating structure and a method for forming the same where, by forming an aluminum oxide layer and a silicon dioxide layer between a product to be coated and a coating layer, durability, reliability and anti-corrosion of the coating layer can be improved and furthermore, product yield can also be improved. The coating structure formed on the surface of a product includes an aluminum oxide (Al2O3) layer formed on the surface of the product, a silicon dioxide (SiO2) layer formed on the surface of the aluminum oxide (Al2O3) layer, and a coating composition layer formed on the silicon dioxide (SiO2) layer.
公开/授权文献
- US20130143017A1 COATING STRUCTURE AND METHOD FOR FORMING THE SAME 公开/授权日:2013-06-06
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