发明授权
- 专利标题: Substrate and assembly thereof with dielectric removal for increased post height
- 专利标题(中): 衬底及其组装与电介质去除增加后柱高度
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申请号: US13155845申请日: 2011-06-08
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公开(公告)号: US08884432B2公开(公告)日: 2014-11-11
- 发明人: Kazuo Sakuma , Philip Damberg , Belgacem Haba
- 申请人: Kazuo Sakuma , Philip Damberg , Belgacem Haba
- 申请人地址: US CA San Jose
- 专利权人: Tessera, Inc.
- 当前专利权人: Tessera, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- 主分类号: H05K1/09
- IPC分类号: H05K1/09 ; H01L23/498
摘要:
An interconnection substrate includes a plurality of electrically conductive elements of at least one wiring layer defining first and second lateral directions. Electrically conductive projections for bonding to electrically conductive contacts of at least one component external to the substrate, extend from the conductive elements above the at least one wiring layer. The conductive projections have end portions remote from the conductive elements and neck portions between the conductive elements and the end portions. The end portions have lower surfaces extending outwardly from the neck portions in at least one of the lateral directions. The substrate further includes a dielectric layer overlying the conductive elements and extending upwardly along the neck portions at least to the lower surfaces. At least portions of the dielectric layer between the conductive projections are recessed below a height of the lower surfaces.
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