发明授权
- 专利标题： Double sidewall image transfer process
- 专利标题（中）： 双侧壁图像传输过程
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申请号： US13709541申请日： 2012-12-10
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公开(公告)号： US08889561B2公开(公告)日： 2014-11-18
- 发明人: Youngtag Woo , Jongwook Kye , Dinesh Somasekhar
- 申请人： Youngtag Woo , Jongwook Kye , Dinesh Somasekhar
- 申请人地址： KY Grand Cayman
- 专利权人： GlobalFoundries Inc.
- 当前专利权人： GlobalFoundries Inc.
- 当前专利权人地址： KY Grand Cayman
- 代理机构： Dittavong & Steiner, P.C.
- 主分类号： H01L21/308
- IPC分类号： H01L21/308 ; H01L21/8238 ; H01L27/11 ; H01L27/088
摘要：
Methodology enabling a generation of fins having a variable fin pitch less than 40 nm, and the resulting device are disclosed. Embodiments include: forming a hardmask on a substrate; providing first and second mandrels on the hardmask; providing a first spacer on each side of each of the first and second mandrels; removing the first and second mandrels; providing, after removal of the first and second mandrels, a second spacer on each side of each of the first spacers; and removing the first spacers.
公开/授权文献
- US20140159164A1 DOUBLE SIDEWALL IMAGE TRANSFER PROCESS 公开/授权日：2014-06-12
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