发明授权
- 专利标题: Radiation source and method for lithographic apparatus for device manufacture
- 专利标题(中): 用于器件制造的光刻设备的辐射源和方法
-
申请号: US14342007申请日: 2012-07-27
-
公开(公告)号: US08890099B2公开(公告)日: 2014-11-18
- 发明人: Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
- 申请人: Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Bernard Van Essen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C
- 国际申请: PCT/EP2012/064779 WO 20120727
- 国际公布: WO2013/029896 WO 20130307
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F7/20 ; H01L25/13
摘要:
A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.
公开/授权文献
信息查询