发明授权
- 专利标题: Illumination optical system, exposure apparatus, and method of manufacturing device
- 专利标题(中): 照明光学系统,曝光装置和制造装置的方法
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申请号: US13336022申请日: 2011-12-23
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公开(公告)号: US08891062B2公开(公告)日: 2014-11-18
- 发明人: Toshihiko Tsuji
- 申请人: Toshihiko Tsuji
- 申请人地址: JP
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP
- 代理机构: Rossi, Kimms & McDowell LLP
- 优先权: JP2011-000002 20110101
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator which uniformizes light intensity distributions of the plurality of light beams generated by the divider, a condenser which condenses the light beam from the first reflective integrator, a second reflective integrator which receives the light beam from the condenser and illuminates the illumination surface, and an aperture stop arranged between the second reflective integrator and the illumination surface, wherein the divider generates the plurality of light beams so that light beams each having a cross-sectional shape different from a cross-sectional shape of the light provided from the light source to the divider enter a plane on which the aperture stop is arranged.
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