Invention Grant
- Patent Title: Swath height adjustments
- Patent Title (中): 幅高调整
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Application No.: US13408383Application Date: 2012-02-29
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Publication No.: US08894174B2Publication Date: 2014-11-25
- Inventor: Yngvar Rossow Sethne , Utpal Kumar Sarkar , Marcos Casaldaliga Albisu
- Applicant: Yngvar Rossow Sethne , Utpal Kumar Sarkar , Marcos Casaldaliga Albisu
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: B41J29/38
- IPC: B41J29/38 ; B41J2/21 ; B41J29/393

Abstract:
In one example, a first swath is caused to be printed by a print unit on a media. The media is advanced with respect to the print unit. For a nominal second swath to be printed to beneath and adjacent to the first swath, a plurality of adjustment regions along the width of the nominal second swath are determined in accordance with a profile of non-constant advance errors for the media. An adjusted second swath is formed by, for each of the regions, adjusting the height of the nominal second swath in memory based on the determined amount of advancement error for the region. The print unit is caused to print the adjusted second swath on the media.
Public/Granted literature
- US20120212527A1 SWATH HEIGHT ADJUSTMENTS Public/Granted day:2012-08-23
Information query
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