发明授权
- 专利标题: Electronic device and method for manufacturing the same
- 专利标题(中): 电子设备及其制造方法
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申请号: US13443932申请日: 2012-04-11
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公开(公告)号: US08894836B2公开(公告)日: 2014-11-25
- 发明人: Hiroshi Katsube , Jun Nishikawa
- 申请人: Hiroshi Katsube , Jun Nishikawa
- 申请人地址: JP Nagaokakyo-Shi, Kyoto-fu
- 专利权人: Murata Manufacturing Co., Ltd.
- 当前专利权人: Murata Manufacturing Co., Ltd.
- 当前专利权人地址: JP Nagaokakyo-Shi, Kyoto-fu
- 代理机构: Dickstein Shapiro LLP
- 优先权: JP2005-164841 20050603
- 主分类号: C25D5/50
- IPC分类号: C25D5/50 ; H01G4/30 ; H01G4/232
摘要:
A highly reliable electronic device that prevents entry of a plating solution via an external electrode and entry of moisture of external environment inside thereof, and generates no soldering defects or solder popping defects which are caused by precipitation of a glass component on a surface of the external electrode. The electrode structure of the electronic device is formed of Cu-baked electrode layers primarily composed of Cu, Cu plating layers formed on the Cu-baked electrode layers and which are processed by a recrystallization treatment, and upper-side plating layers formed on the Cu plating layers. After the Cu plating layers are formed, a heat treatment is performed at a temperature in the range of a temperature at which the Cu plating layers are recrystallized to a temperature at which glass contained in a conductive paste is not softened, so that the Cu plating layers are recrystallized.
公开/授权文献
- US20120196032A1 Electronic Device and Method for Manufacturing the Same 公开/授权日:2012-08-02
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