发明授权
- 专利标题： Crystalline carbonaceous material with controlled interlayer spacing and method of preparing same
- 专利标题（中）： 具有受控层间距的结晶碳质材料及其制备方法
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申请号： US13571013申请日： 2012-08-09
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公开(公告)号： US08894964B2公开(公告)日： 2014-11-25
- 发明人: Bok-Hyun Ka , Kyeu-Yoon Sheem , Da-Un Han , Hyun-Uk Jo , Sumihito Ishida , Eui-Hwan Song
- 申请人： Bok-Hyun Ka , Kyeu-Yoon Sheem , Da-Un Han , Hyun-Uk Jo , Sumihito Ishida , Eui-Hwan Song
- 申请人地址： KR Giheung-gu, Yongin-si, Gyeonggi-do
- 专利权人： Samsung SDI Co., Ltd.
- 当前专利权人： Samsung SDI Co., Ltd.
- 当前专利权人地址： KR Giheung-gu, Yongin-si, Gyeonggi-do
- 代理商 Robert E. Bushnell, Esq.
- 优先权： KR10-2010-0057760 20100617
- 主分类号： H01M4/13
- IPC分类号： H01M4/13 ; C01B31/04 ; H01M4/587 ; H01G11/24 ; H01G11/04 ; H01G11/42
摘要：
A crystalline carbon material with controlled interlayer spacing and a method of manufacturing the crystalline carbon material are disclosed. The crystalline carbon material has peaks of a (002) plane at 2θ=23°±5.0° and 2θ=26.5°±1.0° when X-ray diffraction is measured using a CuKα ray. The peak height at 2θ=23°±5.0° is higher than the one at 2θ=26.5°±1.0°.