Invention Grant
US08895226B2 Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
有权
用于DUV滤光的涂料组合物，使用该方法形成光致抗蚀剂图案的方法和使用该方法制造半导体器件的方法
- Patent Title: Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
- Patent Title (中): 用于DUV滤光的涂料组合物，使用该方法形成光致抗蚀剂图案的方法和使用该方法制造半导体器件的方法
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Application No.: US14223540Application Date: 2014-03-24
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Publication No.: US08895226B2Publication Date: 2014-11-25
- Inventor: Hyun-Woo Kim , Hai-Sub Na , Chil-Hee Chung , Han-Ku Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2010-0071605 20100723
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/038 ; G03F7/095 ; G03F7/11 ; G02B5/20 ; G02B5/22
Abstract:
Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.
Public/Granted literature
Information query
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