发明授权
- 专利标题: Method and device for planning a treatment
- 专利标题(中): 治疗方法和设备
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申请号: US12094903申请日: 2006-11-23
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公开(公告)号: US08897417B2公开(公告)日: 2014-11-25
- 发明人: Eike Rietzel
- 申请人: Eike Rietzel
- 申请人地址: DE München
- 专利权人: Siemens Aktiengesellschaft
- 当前专利权人: Siemens Aktiengesellschaft
- 当前专利权人地址: DE München
- 代理机构: Lempia Summerfield Katz LLC
- 优先权: DE102005056701 20051128
- 国际申请: PCT/EP2006/068788 WO 20061123
- 国际公布: WO2007/060187 WO 20070531
- 主分类号: A61N5/10
- IPC分类号: A61N5/10 ; G06F19/00
摘要:
A device for planning an irradiation is provided. The device includes an evaluation module with an input for receiving input data, a memory and an output for outputting determined output data. The evaluation module is designed for using the input data that includes the type and number of the imaging units present, variables characterizing the tumor and/or variables characterizing the patient, in order to determine the output data that includes the type of the imaging unit, the frequency of use of the imaging unit and/or the parameters for setting the imaging unit to be used in the form of an imaging plan with the aid of a functional relationship, which is based on experience, stored in the memory.
公开/授权文献
- US20080292158A1 Method and Device for Planning a Treatment 公开/授权日:2008-11-27