发明授权
US08898614B2 Integrated circuit device with reduced leakage and method therefor
有权
具有减少泄漏的集成电路装置及其方法
- 专利标题: Integrated circuit device with reduced leakage and method therefor
- 专利标题(中): 具有减少泄漏的集成电路装置及其方法
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申请号: US12762439申请日: 2010-04-19
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公开(公告)号: US08898614B2公开(公告)日: 2014-11-25
- 发明人: Puneet Sharma , Magdy S. Abadir , Scott P. Warrick
- 申请人: Puneet Sharma , Magdy S. Abadir , Scott P. Warrick
- 申请人地址: US TX Austin
- 专利权人: Freescale Semiconductor, Inc.
- 当前专利权人: Freescale Semiconductor, Inc.
- 当前专利权人地址: US TX Austin
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G06F9/455 ; G06F11/22
摘要:
A method includes preferentially placing fill regions adjacent to transistors of a particular conductivity type, such as p-channel transistors, for a plurality of standard cell instances of a device design. The method also includes evaluating all transistors of the first conductivity type prior to evaluating any transistors of a second conductivity type. The second conductivity type is opposite the first conductivity type. For each transistor being evaluated, it is determined whether a criterion is me. A fill region is placed within a field isolation region adjacent to the transistor if the criterion is met.
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