发明授权
- 专利标题: Gas treatment device
- 专利标题(中): 气体处理装置
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申请号: US13265391申请日: 2010-09-09
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公开(公告)号: US08899076B2公开(公告)日: 2014-12-02
- 发明人: Kazuhiro Takeda , Yosuke Nakagawa , Tomoaki Takeda , Yasushi Mori
- 申请人: Kazuhiro Takeda , Yosuke Nakagawa , Tomoaki Takeda , Yasushi Mori
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Heavy Industries Compressor Corporation
- 当前专利权人: Mitsubishi Heavy Industries Compressor Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2009-227019 20090930
- 国际申请: PCT/JP2010/065468 WO 20100909
- 国际公布: WO2011/040199 WO 20110407
- 主分类号: F25J3/00
- IPC分类号: F25J3/00 ; F25J3/06
摘要:
Disclosed is a gas treatment device that can efficiently regulate the temperature of a gas without being affected by load. Said device is provided with: a compressor (1); a heat exchanger; a separator; an expander (3); a refrigerant gas flow control valve (22); a branching channel (13); a first branching-channel heat exchanger (24) and a second branching-channel heat exchanger (25); a first outlet channel that is connected to a liquefied process gas outlet on the separator and that bypasses the first branching-channel heat exchanger (24); a second outlet channel that is connected to an outlet on the expander (3) and that bypasses the second branching-channel heat exchanger (25); a first thermometer (23) in a main channel; a second thermometer (26) in the branching channel (13); a third thermometer (27) in the separator; a flow control valve (20) on the main channel; and a control means (5) that controls the flow control valve (20) and/or the refrigerant gas flow control valve (22) on the basis of temperatures measured by the first through third thermometers (23, 26, 27).
公开/授权文献
- US20120060528A1 GAS TREATMENT DEVICE 公开/授权日:2012-03-15
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